专利名称：DIFFUSION BARRIER FOR ASSEMBLIES WITH
METALLIC AND SILICON-CONTAININGCOMPONENTS AND METHOD THEREFOR
发明人：Krishan Lal Luthra,Douglas William McKee申请号：US10906405申请日：20050218
公开号：US20060188736A1公开日：20060824
专利附图：
摘要：A method for inhibiting diffusion of silicon into a support structure from acomponent formed of a silicon-containing material, and an assembly formed thereby. Thecomponent is supported and contacted by the support structure so as to define acontact interface therebetween. An barrier coating is present on the component and/orthe support structure, so as to be disposed at the contact interface to prevent directphysical contact between the silicon-containing material and the superalloy substrate.
申请人：Krishan Lal Luthra,Douglas William McKee
地址：780 Road Oak Drive Schenectady NY 12309 US,20 Velina Drive Burnt Hills NY12027 US
国籍：US,US
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